RAPID ISOTHERMAL ANNEALING OF ION-IMPLANTATION DAMAGE USING A THERMAL-RADIATION SOURCE

被引：50
|
作者：
FULKS, RT
RUSSO, CJ
HANLEY, PR
KAMINS, TI
机构：
[1] VARIAN ASSOCIATES,DIV EXTR,PALO ALTO,CA 94303
[2] HEWLETT PACKARD LABS,PALO ALTO,CA 94304
来源：
APPLIED PHYSICS LETTERS | 1981年 / 39卷 / 08期
关键词：
D O I：
10.1063/1.92818
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：604 / 606
页数：3
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