POWER ABSORPTION INSIDE HELICON PLASMA OF HELIUM RF ION SOURCE IN NONAXIAL MAGNETIC FIELD

被引：0
|
作者：
Alexenko, O. V. [1 ]
Miroshnichenko, V. I. [1 ]
Voznyi, V. I. [1 ]
机构：
[1] NAS Ukraine, Inst Appl Phys, Sumy, Ukraine
来源：
PROBLEMS OF ATOMIC SCIENCE AND TECHNOLOGY | 2015年 / 04期
关键词：
D O I：
暂无
中图分类号：
O57 [原子核物理学、高能物理学];
学科分类号：
070202 ;
摘要：
The paper studies integral and one-dimensional distribution of RF electromagnetic field absorption in a helicon plasma with external magnetic field directed at an angle to a plasma plane. A simplified model of a helicon plasma plane layer is used here. Calculation results are used to explain power absorption in a compact helicon ion source with nonuniform external magnetic field. An ion source is a part of a nuclear scanning microprobe (NSMP) injector at the Institute of Applied Physics NAS of Ukraine. Calculations for ion source parameters of the NSMP injector show a resonant behaviour of integral RF power absorption as a function of a magnetic field inclination angle. A model (planar) geometry is verified here for solution of this problem.
引用
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页码：12 / 17
页数：6
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