POWER ABSORPTION INSIDE HELICON PLASMA OF HELIUM RF ION SOURCE IN NONAXIAL MAGNETIC FIELD

被引：0

作者：

Alexenko, O. V. ^{[1
]}

Miroshnichenko, V. I. ^{[1
]}

Voznyi, V. I. ^{[1
]}

机构：

[1] NAS Ukraine, Inst Appl Phys, Sumy, Ukraine

来源：

PROBLEMS OF ATOMIC SCIENCE AND TECHNOLOGY | 2015年 / 04期

关键词：

D O I：

暂无

中图分类号：

O57 [原子核物理学、高能物理学];

学科分类号：

070202 ;

摘要：

The paper studies integral and one-dimensional distribution of RF electromagnetic field absorption in a helicon plasma with external magnetic field directed at an angle to a plasma plane. A simplified model of a helicon plasma plane layer is used here. Calculation results are used to explain power absorption in a compact helicon ion source with nonuniform external magnetic field. An ion source is a part of a nuclear scanning microprobe (NSMP) injector at the Institute of Applied Physics NAS of Ukraine. Calculations for ion source parameters of the NSMP injector show a resonant behaviour of integral RF power absorption as a function of a magnetic field inclination angle. A model (planar) geometry is verified here for solution of this problem.

引用

页码：12 / 17

页数：6

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