DETECTION OF SPUTTER CONTAMINATION AND SPUTTER-ETCH RESIDUE BY ION MICRO-PROBE ANALYSIS

被引：0
|
作者：
ANDREWS, JM
KATZ, LE
COLBY, JW
机构：
[1] BELL TEL LABS INC, ALLENTOWN, PA 18103 USA
[2] KEVEX CORP, BURLINGAME, CA 94010 USA
来源：
THIN SOLID FILMS | 1980年 / 67卷 / 02期
关键词：
D O I：
10.1016/0040-6090(80)90466-6
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：325 / 340
页数：16
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