DETECTION OF SPUTTER CONTAMINATION AND SPUTTER-ETCH RESIDUE BY ION MICRO-PROBE ANALYSIS

被引：0

作者：

ANDREWS, JM

KATZ, LE

COLBY, JW

机构：

[1] BELL TEL LABS INC, ALLENTOWN, PA 18103 USA

[2] KEVEX CORP, BURLINGAME, CA 94010 USA

来源：

THIN SOLID FILMS | 1980年 / 67卷 / 02期

关键词：

D O I：

10.1016/0040-6090(80)90466-6

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：325 / 340

页数：16

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