MICROSTRUCTURES OF SPUTTERED PBTIO3 THIN-FILMS

被引：11

作者：

SATOH, T ^{[1
]}

WASA, K ^{[1
]}

TABATA, K ^{[1
]}

ADACHI, H ^{[1
]}

ICHIKAWA, Y ^{[1
]}

SETSUNE, K ^{[1
]}

机构：

[1] MATSUSHITA ELECT IND CO LTD,CENT RES LABS,KYOTO 61902,JAPAN

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1995年 / 13卷 / 03期

关键词：

D O I：

10.1116/1.579577

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Ultrathin stoichiometric PbTio3 films, 10–100 nm thick, were deposited on (001) SrTiO3 substrate at 600 °C by rf planar magnetron sputtering to understand the micro structure of initial film growth. The electron microscopy and x-ray diffraction analysis suggested epitaxial growth of (001) PbTio3/(001) SrTiO3 with three-dimensional crystal orientation; however, the PbTio3 films still included crystalboundaries. Miscut (001) SrTiO3 substrates reduced the crystal boundaries and provided continuous ultrathin films of single crystal PbTio3. Rapid thermal annealing at 600 °C for 10 s further improved their crystallinity. © 1995, American Vacuum Society. All rights reserved.

引用

页码：1022 / 1026

页数：5

共 50 条

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