PHOTODEGRADATION OF POLY(ORTHO-(TRIMETHYLSILYL)-PHENYLACETYLENE) IN SOLUTIONS

被引：5
|
作者：
NEOH, KG [1 ]
KANG, ET [1 ]
TAN, KL [1 ]
机构：
[1] NATL UNIV SINGAPORE,DEPT PHYS,SINGAPORE 0511,SINGAPORE
来源：
POLYMER | 1991年 / 32卷 / 02期
关键词：
PHOTODEGRADATION; POLY(ORTHO-(TRIMETHYLSILYL)PHENYLACETYLENE); LIGHT IRRADIATION; X-RAY PHOTOELECTRON SPECTROSCOPY; CHARGE TRANSFER;
D O I：
10.1016/0032-3861(91)90006-5
中图分类号：
O63 [高分子化学（高聚物）];
学科分类号：
070305 ; 080501 ; 081704 ;
摘要：
Poly(o-(trimethylsilyl)phenylacetylene), poly(TMSPA) has been found to be highly stable in organic solvents in the absence of light and also in film form under ultra-violet/visible light irradiation. However, when poly(TMSPA) in chlorinated solvents is irradiated with ultra-violet and short-wavelength visible light, the polymer degrades and the rate of degradation is highest in the more highly chlorinated solvents such as CHCl3 and CCl4. After 2 h irradiation of a 2 x 10(-3) M CCl4 solution the molecular weight of poly(TMSPA) may decrease by almost two orders of magnitude. Ultra-violet/visible absorption spectroscopy suggests the presence of charge-transfer interaction between CHCl3 and CH2Cl2 with the poly(TMSPA) after irradiation. X-ray photoelectron spectroscopy results indicate that chlorine is incorporated into the polymer during the degradation process.
引用
收藏
页码：226 / 230
页数：5
相关论文
共 50 条
12345