Control of Polarity by Magnetic Array Table in Magnetic Abrasive Polishing Process

被引:1
|
作者
Gang, Han-Sung [1 ]
Kim, Tae-Hui [1 ]
Kawk, Jae-Seob [2 ]
机构
[1] Pukyong Natl Univ, Grad Sch, Busan, South Korea
[2] Pukyong Natl Univ, Sch Mech Engn, Busan, South Korea
关键词
Magnetic Abrasive Polishing; Magnetic Flux Density; Magnetic Array Table; Electro Magnet Analysis;
D O I
10.3795/KSME-A.2010.34.11.1643
中图分类号
TH [机械、仪表工业];
学科分类号
0802 ;
摘要
It is very difficult to polish non-magnetic materials by the magnetic abrasive polishing (MAP) process because magnetic force is required for MAP, but the magnetic force for non-magnetic materials is low. In this study, we aimed to develop a magnetic array table and control the magnetic polarity such that the magnetic force can be increased for the MAP of non-magnetic materials. The newly designed magnetic array table has 32 electro magnets, and the magnetic polarity of each electro-magnet can be easily controlled by changing the electric polarity. It was analytically verified that the magnetic flux density of non-magnetic materials can be varied by varying the applied magnetic polarity
引用
收藏
页码:1643 / 1648
页数:6
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