SILICIDE FORMATION IN THIN CO-SPUTTERED (TITANIUM + SILICON) FILMS ON POLYCRYSTALLINE SILICON AND SIO2

被引：105
|
作者：
MURARKA, SP
FRASER, DB
机构：
[1] Bell Laboratories, Murray Hill, NJ 07974, United States
来源：
JOURNAL OF APPLIED PHYSICS | 1980年 / 51卷 / 01期
关键词：
Compilation and indexing terms; Copyright 2025 Elsevier Inc;
D O I：
10.1063/1.327379
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
6
引用
收藏
页码：350 / 356
页数：7
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