LARGE MAGNETORESISTANCE EFFECTS IN UHV GROWN FCC (111) CO/CU MULTILAYERS

被引：38

作者：

RENARD, JP ^{[1
]}

BEAUVILLAIN, P ^{[1
]}

DUPAS, C ^{[1
]}

LEDANG, K ^{[1
]}

VEILLET, P ^{[1
]}

VELU, E ^{[1
]}

MARLIERE, C ^{[1
]}

RENARD, D ^{[1
]}

机构：

[1] UNIV PARIS 11,INST OPT THEOR APPL,CNRS,UA 014,F-91405 ORSAY,FRANCE

来源：

JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS | 1992年 / 115卷 / 2-3期

关键词：

D O I：

10.1016/0304-8853(92)90044-O

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Co/Cu multilayers have been grown in ultrahigh vacuum on Au(111) buffer layers. As shown by X-ray diffraction an Co-59 NMR, their structure is fcc (111) with atomically flat interfaces. The studied samples with Cu thicknesses of 3, 5 and 10 atomic monolayers exhibit a large magnetoresistance (MR). This result and the large saturation field observed by MR an by magnetization measurements could be indicative of antiferromagnetic interlayer couplings, previously reported for sputtered Co/Cu multilayers with comparable Cu thickness.

引用

页码：L147 / L151

页数：5

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