LARGE MAGNETORESISTANCE EFFECTS IN UHV GROWN FCC (111) CO/CU MULTILAYERS

Co/Cu multilayers have been grown in ultrahigh vacuum on Au(111) buffer layers. As shown by X-ray diffraction an Co-59 NMR, their structure is fcc (111) with atomically flat interfaces. The studied samples with Cu thicknesses of 3, 5 and 10 atomic monolayers exhibit a large magnetoresistance (MR). This result and the large saturation field observed by MR an by magnetization measurements could be indicative of antiferromagnetic interlayer couplings, previously reported for sputtered Co/Cu multilayers with comparable Cu thickness.