DIFFRACTION-LIMITED BLAZED REFLECTION DIFFRACTIVE MICROLENSES FOR OBLIQUE-INCIDENCE FABRICATED BY ELECTRON-BEAM LITHOGRAPHY

被引:30
|
作者
SHIONO, T
OGAWA, H
机构
[1] Central Research Laboratories, Matsushita Electrical Industrial Co. Ltd., Moriguchi, Osaka
来源
APPLIED OPTICS | 1991年 / 30卷 / 25期
关键词
REFLECTION LENS; ELECTRON-BEAM LITHOGRAPHY; DIFFRACTIVE LENS; OBLIQUE INCIDENCE;
D O I
10.1364/AO.30.003643
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
Blazed reflection diffractive microlenses potentially have many uses. The fabrication accuracy and the optical characteristics of these microlenses can be greatly improved compared with transmission diffractive microlenses. The reflection microlenses for oblique incidence can be flexibly used without a beam splitter. The functions of the electron-beam writing system that we developed have been expanded so that the diffraction-limited microlenses for oblique incidence can be fabricated. It is demonstrated that the fabricated microlens exhibits diffraction-limited focusing characteristics with 78% high efficiency at a large oblique angle of 30-degrees. These microlenses could be used as key devices in planar optics and optical interconnections.
引用
收藏
页码:3643 / 3649
页数:7
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