PHOTOCHEMICAL PROPERTIES OF ULTRATHIN TIO2 FILMS PREPARED BY CHEMICAL VAPOR-DEPOSITION

被引:18
|
作者
SATO, S [1 ]
SOBCZYNSKI, A [1 ]
WHITE, JM [1 ]
BARD, AJ [1 ]
CAMPION, A [1 ]
FOX, MA [1 ]
MALLOUK, TE [1 ]
WEBBER, SE [1 ]
机构
[1] UNIV TEXAS,DEPT CHEM,AUSTIN,TX 78712
关键词
D O I
10.1016/1010-6030(89)85022-1
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
引用
收藏
页码:283 / 290
页数:8
相关论文
共 50 条
  • [31] EFFECTS OF TEMPERATURE ON THE PROPERTIES OF TiO2 PHOTOCATALYSTS PREPARED BY THE CHEMICAL VAPOR DEPOSITION (CVD) METHOD
    Wang, Kuo-Hua
    Hsieh, Yung-Hsu
    Lin, Tsai-Tu
    Chang, Chen-Yu
    REACTION KINETICS AND CATALYSIS LETTERS, 2008, 95 (01): : 39 - 46
  • [32] Effects of temperature on the properties of TiO2 photocatalysts prepared by the chemical vapor deposition (CVD) method
    Kuo-Hua Wang
    Yung-Hsu Hsieh
    Tsai-Tu Lin
    Chen-Yu Chang
    Reaction Kinetics and Catalysis Letters, 2008, 95
  • [33] PREPARATION AND PROPERTIES OF MICROCRYSTALLINE SILICON FILMS USING PHOTOCHEMICAL VAPOR-DEPOSITION
    SAITOH, T
    SHIMADA, T
    MIGITAKA, M
    TARUI, Y
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 1983, 59-6 (DEC) : 715 - 718
  • [34] Effect of laser wavelength on phase and microstructure of TiO2 films prepared by laser chemical vapor deposition
    Gao, Ming
    Ito, Akihiko
    Goto, Takashi
    SURFACE & COATINGS TECHNOLOGY, 2014, 244 : 166 - 172
  • [35] Type of Plasmas and microstructures of TiO2 thin films prepared by plasma enhanced chemical vapor deposition
    Borrás, Ana
    Cotrino, José
    González-Elipe, Agustín R.
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2007, 154 (12) : P152 - P157
  • [36] TIO2 PARTICLES BY CHEMICAL VAPOR-DEPOSITION - PARTICLE FORMATION MECHANISM AND CHEMICAL-KINETICS
    KANAI, T
    KOMIYAMA, H
    INOUE, H
    KAGAKU KOGAKU RONBUNSHU, 1985, 11 (03) : 317 - 323
  • [37] CHARACTERIZATION OF GERMANIUM PHOSPHOSILICATE FILMS PREPARED BY MODIFIED CHEMICAL VAPOR-DEPOSITION
    GREENBERGKOSINSKI, S
    SOTO, L
    NAGEL, SR
    WATROUS, T
    AMERICAN CERAMIC SOCIETY BULLETIN, 1981, 60 (08): : 860 - 860
  • [38] YTTRIA STABILIZED ZIRCONIA TRANSPARENT FILMS PREPARED BY CHEMICAL VAPOR-DEPOSITION
    YAMANE, H
    HIRAI, T
    JOURNAL OF CRYSTAL GROWTH, 1989, 94 (04) : 880 - 884
  • [39] GROWTH MECHANISMS OF DIAMOND CRYSTALS AND FILMS PREPARED BY CHEMICAL VAPOR-DEPOSITION
    BONNOT, AM
    MATHIS, BS
    MERCIER, J
    LEROY, J
    VITTON, JP
    DIAMOND AND RELATED MATERIALS, 1992, 1 (2-4) : 230 - 234
  • [40] DOPING PROPERTIES OF MICROCRYSTALLINE SILICON PREPARED BY MERCURY SENSITIZED PHOTOCHEMICAL VAPOR-DEPOSITION
    SUZUKI, K
    KUROIWA, K
    KAMISAKO, K
    TARUI, Y
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1990, 50 (02): : 227 - 231