ANALYSIS OF MARKER MOTION IN THIN-FILM SILICIDE FORMATION

被引：32
|
作者：
TU, KN [1 ]
机构：
[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
来源：
JOURNAL OF APPLIED PHYSICS | 1977年 / 48卷 / 08期
关键词：
D O I：
10.1063/1.324178
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：3379 / 3382
页数：4
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