LOW-TEMPERATURE ANNEALING STUDIES IN GE

被引：77
|
作者：
MACKAY, JW
KLONTZ, EE
机构：
来源：
JOURNAL OF APPLIED PHYSICS | 1959年 / 30卷 / 08期
关键词：
D O I：
10.1063/1.1735304
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：1269 / 1274
页数：6
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