ION-BEAM ASSISTED DEPOSITION OF INSULATING LAYERS

The assistance of ions in the form of a beam during deposition of a film (IBAD) has the advantage of an independent and well defined control of the ion bombardment parameters. This enables the scientists to better understand the role of ion bombardment and to tailor coatings according to the desired properties. In this paper examples of the interconnection of microscopic and macroscopic thin film properties are presented and discussed. As example for an elemental film carbon is chosen, which may exist as soft or hard amorphous insulating or slightly conducting layer. In the case of compounds TiN and Cr2O3 films are described. Their mechanical and microstructure properties depend strongly on the degree of ion bombardment. Finally the generation of multipurpose gradient films is described. Al/AlN and TiC/C serve as examples for coatings for corrosion protection and wear and friction reduction.