GLOW-DISCHARGE UNIT MAKES MULTILAYER DEPOSITION EASY

被引：0

|

作者：

HORSLEY, AW

机构：

来源：

ELECTRONICS | 1969年 / 42卷 / 02期

关键词：

D O I：

暂无

中图分类号：

学科分类号：

摘要：

引用

收藏

页码：84 / &

相关论文

共 50 条

[1] GLOW-DISCHARGE DEPOSITION OF TETRAMETHYLSILANE FILMS
CATHERINE, Y
ZAMOUCHE, A
PLASMA CHEMISTRY AND PLASMA PROCESSING, 1985, 5 (04) : 353 - 368
[2] GLOW-DISCHARGE POLYMER DEPOSITION IN A TRIODE SYSTEM
ANDO, K
AOZASA, M
THIN SOLID FILMS, 1974, 23 (01) : S45 - S48
[3] UNIFORMITY OF DEPOSITION OF POLYMERIC FILMS IN A GLOW-DISCHARGE
GILMAN, AB
TUZOV, LS
KOLOTYRKIN, VM
POTAPOV, VK
HIGH ENERGY CHEMISTRY, 1983, 17 (06) : 442 - 443
[4] CONTAMINATION EFFECTS IN GLOW-DISCHARGE DEPOSITION SYSTEMS
JANSEN, F
KUHMAN, D
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1988, 6 (01): : 13 - 18
[5] GLOW-DISCHARGE
HIROSE, M
SEMICONDUCTORS AND SEMIMETALS, 1984, 21 : 9 - 39
[6] TREATMENT OF ULTRACENTRIFUGE TUBES IN A GLOW-DISCHARGE MAKES THEIR SURFACES WETTABLE
ZOLLINGER, M
MAMETBRATLEY, MD
KARSKAWYSOCKI, B
ANALYTICAL BIOCHEMISTRY, 1984, 142 (01) : 88 - 90
[7] DEPOSITION OF FLUOROCARBON FILMS BY REMOTE RF GLOW-DISCHARGE
CASTNER, DG
FAVIA, P
RATNER, BD
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1995, 209 : 165 - POLY
[8] GLOW-DISCHARGE ASPECTS OF PLASMA DEPOSITION AND PLASMA ETCHING
VOSSEN, JL
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1978, 125 (03) : C155 - C155
[9] GLOW-DISCHARGE OPTICAL SPECTROSCOPY FOR MONITORING SPUTTER DEPOSITION
SEQUEDAO.F
GREENE, JE
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (01): : 174 - 174
[10] A STUDY OF THE SILANE GLOW-DISCHARGE DEPOSITION BY ISOTOPIC LABELING
TURBAN, G
CATHERINE, Y
GROLLEAU, B
THIN SOLID FILMS, 1981, 77 (04) : 287 - 300

← 1 2 3 4 5 →