CHEMICAL ETCHING OF SILICON .2. THE SYSTEM HF, HNO3, H2O, AND HC2H3O2

被引：181
|
作者：
ROBBINS, H
SCHWARTZ, B
机构：
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1960年 / 107卷 / 02期
关键词：
D O I：
10.1149/1.2427617
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：108 / 111
页数：4
相关论文
共 50 条
  • [31] MoS2-assisted chemical etching of silicon in an HF/H2O vapor
    Yamamoto, Kaichi
    Utsunomiya, Toru
    Ichii, Takashi
    Sugimura, Hiroyuki
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2024, 63 (04)
  • [32] Thermodynamic Properties and Phase Equilibria in the H2O–HNO3–UO2(NO3)2 System
    A. S. Maliutin
    N. A. Kovalenko
    I. A. Uspenskaya
    Moscow University Chemistry Bulletin, 2020, 75 : 65 - 71
  • [33] Raman spectroscopy of the hydrogen bond in the associates H2O•HNO3 and (HNO3)2NO-3• Evans windows
    Potier, A
    Potier, J
    Herzog, MH
    Herzog, JF
    POLISH JOURNAL OF CHEMISTRY, 1998, 72 (02) : 292 - 301
  • [34] High-performance texturization of multicrystalline silicon wafer by HF/HNO3/H2O system incorporated with MnO2 particles
    Liu, Huan
    Zhao, Lei
    Diao, Hongwei
    Wang, Wenjing
    MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2019, 101 : 149 - 155
  • [35] Reaction of ClONO2 with H2O and HCl in sulfuric acid and HNO3/H2SO4/H2O mixtures
    Hanson, DR
    JOURNAL OF PHYSICAL CHEMISTRY A, 1998, 102 (25): : 4794 - 4807
  • [36] Dynamics of chemical processes in overtone -: Excited HNO3, HNO3-H2O, H2SO4, H2SO4-H2O
    Gerber, R. Benny
    Miller, Yifat
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2006, 231
  • [37] MECHANISM OF COMBUSTION OF MIXTURES OF H-2 WITH O + O2, H2O2, AND HNO3
    BASEVICH, VY
    KOGARKO, SM
    BULLETIN OF THE ACADEMY OF SCIENCES OF THE USSR DIVISION OF CHEMICAL SCIENCE, 1980, 29 (07): : 1050 - 1056
  • [38] THE CLEANING EFFECTS OF HF-HNO3-H2O2 SYSTEM
    PARK, TH
    KO, YS
    SHIM, TE
    LEE, JG
    KIM, YK
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1995, 142 (02) : 571 - 576
  • [39] SOLUBILITY IN HF-HNO3-GEO2-H2O SYSTEM
    ERMAKOV, AA
    MAKAN, SY
    PERFILEV, AI
    ZHURNAL NEORGANICHESKOI KHIMII, 1977, 22 (02): : 577 - 580
  • [40] The mechanism of HF/H2O chemical etching of SiO2
    Kang, JK
    Musgrave, CB
    JOURNAL OF CHEMICAL PHYSICS, 2002, 116 (01): : 275 - 280
12345