CHEMICAL ETCHING OF SILICON .2. THE SYSTEM HF, HNO3, H2O, AND HC2H3O2

被引：181
|
作者：
ROBBINS, H
SCHWARTZ, B
机构：
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1960年 / 107卷 / 02期
关键词：
D O I：
10.1149/1.2427617
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：108 / 111
页数：4
相关论文
共 50 条
  • [1] CHEMICAL ETCHING OF SILICON .2. THE SYSTEM HF, HNO3, H2O, HC2H3O2
    ROBBINS, H
    SCHWARTZ, B
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1958, 105 (08) : C163 - C163
  • [2] CHEMICAL ETCHING OF GERMANIUM IN SOLUTIONS OF HF, HNO3, H2O, AND HC2H3O2
    SCHWARTZ, B
    ROBBINS, H
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1964, 111 (02) : 196 - 201
  • [3] Silicon etching in HF/HNO3/NH3•H2O/H2O system
    Liu, Zhigang
    Sun, Tietun
    An, Jing
    Wang, Jianqiang
    Xu, Xiuqin
    Cui, Rongqiang
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2007, 154 (01) : D21 - D29
  • [4] SPRAY ETCHING OF SILICON IN THE HNO3/HF/H2O SYSTEM
    JOHN, JP
    MCDONALD, J
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1993, 140 (09) : 2622 - 2625
  • [5] CHEMICAL ETCHING OF SILICON .1. THE SYSTEM HF, HNO3, AND H2O
    IRVING, BA
    ROBBINS, H
    SCHWARTZ, B
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1960, 107 (12) : 1020 - 1022
  • [6] CHEMICAL ETCHING OF SILICON .1. THE SYSTEM HF,HNO3, AND H2O
    ROBBINS, H
    SCHWARTZ, B
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1959, 106 (06) : 505 - 508
  • [7] Influence of ammonia on silicon etching in HF/HNO3/H2O system
    Department of Physics, Shanghai Jiaotong University, Shanghai 200240, China
    Shanghai Jiaotong Daxue Xuebao, 2008, 3 (467-470):
  • [8] Variation of silicon etching rate in the HF/HNO3/H2O system
    Solar Energy Institute, Department of Physics, Shanghai Jiaotong University, Shanghai 200240, China
    Taiyangneng Xuebao, 2008, 3 (319-323):
  • [9] The influence of NH4F on silicon etching in HF/HNO3/H2O system
    An, Jing
    Shi, Yang
    Liu, Zhiguang
    Cui, Rongqiang
    Sun, Tietun
    Chen, Tian
    Wang, Jianqiang
    Xu, Xiuqin
    Wang, Jingxiao
    Huang, Jianhua
    Li, Xiang
    Wu, Chunjian
    Du, Jiabin
    PROCEEDINGS OF ISES SOLAR WORLD CONGRESS 2007: SOLAR ENERGY AND HUMAN SETTLEMENT, VOLS I-V, 2007, : 1051 - +
  • [10] CHEMICAL ETCHING OF GERMANIUM .2. THE SYSTEM HF, H2O2, H2O
    ROBBINS, H
    SCHWARTZ, B
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1960, 107 (08) : C184 - C184
12345