EFFECT OF FLOW DIRECTION ON ETCH UNIFORMITY IN PARALLEL-PLATE (RADIAL FLOW) ISOTHERMAL PLASMA REACTORS

被引：12
|
作者：
VENKATESAN, SP
TRACHTENBERG, I
EDGAR, TF
机构：
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1987年 / 134卷 / 12期
关键词：
D O I：
10.1149/1.2100371
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：3194 / 3197
页数：4
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