COPPER-BASE MATERIALS FORMED BY HIGH-RATE SPUTTERING

被引：1

|

作者：

BUSCH, R ^{[1
]}

MCCLANAHAN, ED ^{[1
]}

机构：

[1] BATTELLE MEM INST,PACIF NW LABS,RICHLAND,WA 99352

来源：

THIN SOLID FILMS | 1977年 / 45卷 / 02期

关键词：

D O I：

10.1016/0040-6090(77)90275-9

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

收藏

页码：386 / 386

页数：1

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