CAPTURE OF IMPURITY ATOMS BY VACANCIES IN IMPLANTED LAYERS

被引:0
|
作者
ZELEVINS.VM [1 ]
KACHURIN, GA [1 ]
BOGOMYAK.NP [1 ]
AZIKOV, BS [1 ]
SHIROKOV, LL [1 ]
机构
[1] ACAD SCI USSR,SEMICOND PHYS INST,NOVOSIBIRSK,USSR
来源
SOVIET PHYSICS SEMICONDUCTORS-USSR | 1974年 / 8卷 / 02期
关键词
D O I
暂无
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
引用
收藏
页码:164 / 166
页数:3
相关论文
共 50 条
  • [21] MAGNITUDE OF THE CROSS-SECTION FOR THE CAPTURE OF A VACANCY BY IMPURITY ATOMS IN SILICON
    VINETSKII, VL
    KHOLODAR, GA
    SOVIET PHYSICS SEMICONDUCTORS-USSR, 1984, 18 (02): : 226 - 227
  • [22] KINETICS OF FORMATION OF DEFECTS IN SEMICONDUCTORS IN CASE OF SUCCESSIVE CAPTURE OF SEVERAL VACANCIES BY AN IMPURITY ATOM
    EMTSEV, VV
    MASHOVETS, TV
    TROPP, EA
    SOVIET PHYSICS SEMICONDUCTORS-USSR, 1978, 12 (02): : 169 - 172
  • [23] Formation of interstitial atoms in surface layers of helium-implanted tungsten
    O. V. Dudka
    V. A. Ksenofontov
    A. A. Masilov
    E. V. Sadanov
    Technical Physics Letters, 2013, 39 : 960 - 963
  • [24] Formation of interstitial atoms in surface layers of helium-implanted tungsten
    Dudka, O. V.
    Ksenofontov, V. A.
    Masilov, A. A.
    Sadanov, E. V.
    TECHNICAL PHYSICS LETTERS, 2013, 39 (11) : 960 - 963
  • [25] Doping of diamond by the diffusion of interstitial atoms into layers containing a low density of vacancies
    Prins, JF
    DIAMOND AND RELATED MATERIALS, 1998, 7 (2-5) : 545 - 549
  • [26] Impurity diffusion in ion implanted AlN layers on sapphire substrates by thermal annealing
    Okumura, Hironori
    Watanabe, Yasuhiro
    Shibata, Tomohiko
    Yoshizawa, Kohei
    Uedono, Akira
    Tokunaga, Hiroki
    Koseki, Shuuichi
    Arimura, Tadanobu
    Suihkonen, Sami
    Palacios, Tomas
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2022, 61 (02)
  • [27] LATTICE SITE OCCUPATION OF OVERSIZED IMPURITY ATOMS IMPLANTED IN ALUMINIUM SINGLE CRYSTALS.
    Kloska, M.K.
    Meyer, O.
    Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 1986, B19-20 : 140 - 144
  • [28] THE SUSCEPTIBILITY OF AN IMPURITY - CHANGE IN INTERATOMIC FORCES AROUND IMPLANTED H-ATOMS IN METALS
    SOLT, G
    BECK, H
    HELVETICA PHYSICA ACTA, 1984, 57 (04): : 477 - 477
  • [29] LATTICE SITE OCCUPATION OF OVERSIZED IMPURITY ATOMS IMPLANTED IN ALUMINUM SINGLE-CRYSTALS
    KLOSKA, MK
    MEYER, O
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1987, 19-20 : 140 - 144
  • [30] Electrical resistance of binary ordered alloys with HCP structure in the presence of impurity atoms or thermal vacancies
    Matysina, ZA
    Zaginaichenko, SY
    Schur, DV
    Vlasenko, AY
    HYDROGEN MATERIALS SCIENCE AND CHEMISTRY OF CARBON NANOMATERIALS, 2004, 172 : 481 - 488