MECHANISM OF THE DECOMPOSITION OF RH2O3 THIN-FILMS

被引：0
|
作者：
SALANOV, AN
SAVCHENKO, VI
机构：
来源：
KINETICS AND CATALYSIS | 1995年 / 36卷 / 03期
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中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
The decomposition of Rh2O3 thin films (1 - 10 monolayers) for Rh(100) and polycrystalline rhodium at 400 - 1600 K is studied by thermodesorption (TD) and mathematical modeling. The decomposition of oxide films is accompanied by O-2 liberation at 800 - 900 K and by the appearance of the corresponding ''narrow'' beta(1) peak in the TD spectrum. The model of decomposition, in which the surface layer of the oxide film is continuously covered and its thickness gradually decreases, is considered.
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页码：356 / 362
页数：7
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