DOPING DENSITY DEPENDENT ATTACHMENT OF RHB ON TIO2 ELECTRODES

被引：17
|
作者：
SCHUMACHER, R [1 ]
WILSON, RH [1 ]
HARRIS, LA [1 ]
机构：
[1] GE,CORP RES & DEV,SCHENECTADY,NY 12301
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1980年 / 127卷 / 01期
关键词：
D O I：
10.1149/1.2129648
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：96 / 99
页数：4
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