Factors influencing the performances of micro-strip gas chambers

被引：5
|
作者：
Mack, V
Brom, JM
Fang, R
Fontaine, JC
Huss, D
Kachelhoffer, T
Kettunen, H
Levy, JM
Pallares, A
Barthe, S
Bergdolt, AM
Cailleret, J
Christophel, E
Coffin, J
Eberle, H
Osswald, F
Schunck, JP
Sigward, MH
机构：
[1] Centre de Recherches Nucléaiers de Strasbourg, Université Louis Pasteur, Université de Haute Alsace, 67037 Strasbourg cedex, 23, rue du Loess
来源：
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT | 1995年 / 367卷 / 1-3期
关键词：
D O I：
10.1016/0168-9002(95)00567-6
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
Damages to MSGCs induced by discharges have been investigated. Optimization of electrode shapes and/or deposition of a protective coating allows the increase of the potential difference between anode and cathode, thus increasing the gain. For prototypes of MSGCs made at the Centre de Recherches Nucleaires, each step of the manufacturing processes was carefully controlled. Results are presented on the influence of cleaning processes on the surface resistance of glass substrates.
引用
收藏
页码：173 / 176
页数：4
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