ELECTRON-BEAM LITHOGRAPHY FOR LARGE AREA PATTERNING .1. DEVELOPMENT OF LARGE FIELD DEFLECTION E-BEAM LITHOGRAPHY SYSTEM

被引：0
|
作者：
HOSHINOUCHI, S [1 ]
IWAMI, T [1 ]
SAKAMOTO, M [1 ]
MURAKAMI, H [1 ]
SASAKI, S [1 ]
SHIMIZU, R [1 ]
机构：
[1] OSAKA UNIV,FAC ENGN,DEPT APPL PHYS,SUITA,OSAKA 565,JAPAN
来源：
SCANNING MICROSCOPY | 1990年 / 4卷 / 03期
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中图分类号：
TH742 [显微镜];
学科分类号：
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页码：555 / 561
页数：7
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