A SIMPLE SOURCE FOR UNIFORM AND REPRODUCIBLE DEPOSITION OF THE DOPANT SILICON IN III-V MOLECULAR-BEAM EPITAXY

被引：1

|

作者：

MILLER, DL

SULLIVAN, GJ

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1987年 / 5卷 / 05期

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D O I：

10.1116/1.583620

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

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页码：1377 / 1378

页数：2

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