VACANCY ACCEPTOR COMPLEXES IN GERMANIUM PRODUCED BY ION-IMPLANTATION

被引:5
|
作者
FEUSER, U
VIANDEN, R
ALVES, E
DASILVA, MF
SZILAGYI, E
PASZTI, F
SOARES, JC
机构
[1] INST CIENCIAS & ENGN NUCL,LAB NACL ENGN & TECNOL IND,DEPT FIS,P-2685 SACAVEM,PORTUGAL
[2] HUNGARIAN ACAD SCI,CENT RES INST PHYS,H-1525 BUDAPEST,HUNGARY
[3] UNIV LISBON,CTR FIS NUCL,P-1699 LISBON,PORTUGAL
关键词
D O I
10.1016/0168-583X(91)95762-3
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
Combining results obtained by the gamma-gamma perturbed angular correlation method, Rutherford backscattering and elastic recoil detection of hydrogen, a defect complex formed in germanium by indium implantation is identified as a vacancy trapped by the indium probe.
引用
收藏
页码:1049 / 1052
页数:4
相关论文
共 50 条
  • [1] SUPERCONDUCTIVITY OF AMORPHOUS-GERMANIUM PRODUCED BY ION-IMPLANTATION
    STRITZKER, B
    WUHL, H
    ZEITSCHRIFT FUR PHYSIK B-CONDENSED MATTER, 1976, 24 (04): : 367 - 370
  • [2] Acceptor ion-implantation in SiC
    Handy, EM
    Rao, MV
    Holland, OW
    Jones, KA
    Chi, PH
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2000, 166 : 395 - 398
  • [3] ION-IMPLANTATION OF BORON IN GERMANIUM
    JONES, KS
    HALLER, EE
    JOURNAL OF APPLIED PHYSICS, 1987, 61 (07) : 2469 - 2477
  • [4] REMARKS ON VACANCY MECHANISMS IN ION-IMPLANTATION
    KURATA, M
    MORIKAWA, Y
    NAGAMI, K
    KURODA, H
    JAPANESE JOURNAL OF APPLIED PHYSICS, 1973, 12 (03) : 472 - 473
  • [5] ION-IMPLANTATION DAMAGE AND ANNEALING IN GERMANIUM
    HOLLAND, OW
    APPLETON, BR
    NARAYAN, J
    JOURNAL OF APPLIED PHYSICS, 1983, 54 (05) : 2295 - 2301
  • [6] Ion-implantation and diffusion behaviour of boron in germanium
    Uppal, S
    Willoughby, AFW
    Bonar, JM
    Evans, AGR
    Cowern, NEB
    Morris, R
    Dowsett, MG
    PHYSICA B-CONDENSED MATTER, 2001, 308 : 525 - 528
  • [7] OBSERVATION OF NEW COMMON EMISSIONS IN GAAS PRODUCED BY ION-IMPLANTATION OF 4 ACCEPTOR IMPURITIES
    TAKEUCHI, Y
    MAKITA, Y
    KUDO, K
    NOMURA, T
    TANAKA, H
    IRIE, K
    OHNISHI, N
    APPLIED PHYSICS LETTERS, 1986, 48 (01) : 59 - 61
  • [8] ION-IMPLANTATION IN AMORPHOUS-GERMANIUM AND SILICON
    SEKHAR, P
    JOSHI, MC
    NARASIMHAN, KL
    GUHA, S
    SOLID STATE COMMUNICATIONS, 1978, 26 (12) : 933 - 936
  • [9] Carbon onions produced by ion-implantation
    Cabioc'h, T
    Jaouen, M
    Denanot, MF
    Riviere, JP
    Delafond, J
    Girard, JC
    ELECTRONIC PROPERTIES OF NOVEL MATERIALS - PROGRESS IN MOLECULAR NANOSTRUCTURES: XII INTERNATIONAL WINTERSCHOOL, 1998, 442 : 430 - 434
  • [10] AMORPHOUS GAP PRODUCED BY ION-IMPLANTATION
    SHIMADA, T
    KATO, Y
    SHIRAKI, Y
    KOMATSUBARA, KF
    JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1976, 37 (03) : 305 - 313