ANODIC OXIDATION OF ALUMINUM, CHROMIUM, HAFNIUM, NIOBIUM, TANTALUM, TITANIUM, VANADIUM, AND ZIRCONIUM AT VERY LOW CURRENT DENSITIES

被引：108

|

作者：

JOHANSEN, HA

ADAMS, GB

VANRYSSELBERGHE, P

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1957年 / 104卷 / 06期

关键词：

D O I：

10.1149/1.2428577

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

收藏

页码：339 / 346

页数：8

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