共 50 条
- [42] THE LOW-TEMPERATURE OXIDATION PROBLEM IN YTTRIA-DENSIFIED SILICON-NITRIDE CERAMICS BRITISH CERAMIC TRANSACTIONS AND JOURNAL, 1988, 87 (02): : 70 - 73
- [44] LOW-TEMPERATURE FABRICATION OF SILICON-NITRIDE FILMS BY ARF EXCIMER LASER IRRADIATION APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1988, 46 (04): : 249 - 253
- [45] SYNTHESIS OF SILICON-NITRIDE AND PROPERTIES OF SILICON-NITRIDE SHAPES INDIAN JOURNAL OF TECHNOLOGY, 1978, 16 (04): : 156 - 160
- [46] SILICON FILM FABRICATION BY PHOTO-CVD AND ITS CHARACTERISTICS JAPAN ANNUAL REVIEWS IN ELECTRONICS COMPUTERS & TELECOMMUNICATIONS, 1984, 13 : 37 - 53
- [48] Silicon quantum dot formation using photo-CVD Physics of Semiconductors, Pts A and B, 2005, 772 : 587 - 588
- [50] LOW-TEMPERATURE GROWTH OF SIO2 THIN-FILM BY DOUBLE-EXCITATION PHOTO-CVD JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1987, 26 (06): : 805 - 811