ETCH RESISTANCE OF ELECTRON-BEAM RESISTS IN CHEMICAL DRY ETCHING SYSTEM USING MICROWAVE EXCITATION

被引：6
|
作者：
JINNO, K [1 ]
机构：
[1] NEC TOSHIBA INFORMAT SYST INC,SAIWAI KU,KAWASAKI 210,JAPAN
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS | 1978年 / 17卷 / 07期
关键词：
D O I：
10.1143/JJAP.17.1283
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：1283 / 1284
页数：2
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