SOME INVESTIGATION OF SI AND SIO2 SURFACES ETCHED IN CF4 OR CF4-O2 PLASMA

被引：5
|
作者：
ATANASOVA, ED
KIROV, KI
PANTCHEV, BG
GEORGIEV, SS
机构：
来源：
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1980年 / 59卷 / 02期
关键词：
D O I：
10.1002/pssa.2210590253
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：853 / 859
页数：7
相关论文
共 50 条
  • [1] Simulation of Si and SiO2 etching in CF4 plasma
    Knizikevicius, R.
    VACUUM, 2008, 82 (11) : 1191 - 1193
  • [2] ETCHING OF SI THROUGH SIO2 IN CF4/N2O PLASMA
    WANG, XW
    LIU, MD
    MA, TP
    BARKER, RC
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1988, 135 (02) : 442 - 445
  • [3] SPECTROSCOPIC DIAGNOSTICS OF CF4-O2 PLASMAS DURING SI AND SIO2 ETCHING PROCESSES
    DAGOSTINO, R
    CRAMAROSSA, F
    DEBENEDICTIS, S
    FERRARO, G
    JOURNAL OF APPLIED PHYSICS, 1981, 52 (03) : 1259 - 1265
  • [4] PLASMA ETCHING OF SI AND SIO2 - EFFECT OF OXYGEN ADDITIONS TO CF4 PLASMAS
    MOGAB, CJ
    ADAMS, AC
    FLAMM, DL
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (02): : 333 - 333
  • [5] PLASMA ETCHING OF SI AND SIO2 - EFFECT OF OXYGEN ADDITIONS TO CF4 PLASMAS
    MOGAB, CJ
    ADAMS, AC
    FLAMM, DL
    JOURNAL OF APPLIED PHYSICS, 1978, 49 (07) : 3796 - 3803
  • [6] ETCHING OF SILICON THROUGH SIO2 IN A CF4/N2O PLASMA
    WANG, X
    LIU, MD
    MA, TP
    BARKER, RC
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1986, 133 (11) : C447 - C447
  • [7] Simulation of SiO2 etching in an inductively coupled CF4 plasma
    Xu, Qing
    Li, Yu-Xing
    Li, Xiao-Ning
    Wang, Jia-Bin
    Yang, Fan
    Yang, Yi
    Ren, Tian-Ling
    MODERN PHYSICS LETTERS B, 2017, 31 (06):
  • [8] MAGNETIC-FIELD EFFECTS ON CYLINDRICAL MAGNETRON REACTIVE ION ETCHING OF SI/SIO2 IN CF4 AND CF4/H2 PLASMAS
    YEOM, GY
    KUSHNER, MJ
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1989, 7 (03): : 987 - 992
  • [9] EFFECT OF CATHODE MATERIALS ON REACTIVE ION ETCHING OF SI AND SIO2 IN CF4
    EPHRATH, LM
    JOURNAL OF ELECTRONIC MATERIALS, 1976, 5 (04) : 449 - 449
  • [10] CF AND CF2 ACTINOMETRY IN A CF4/AR PLASMA
    KISS, LDB
    NICOLAI, JP
    CONNER, WT
    SAWIN, HH
    JOURNAL OF APPLIED PHYSICS, 1992, 71 (07) : 3186 - 3192
12345