STOICHIOMETRY EFFECTS ON THE FRACTURE OF TIO2-X

被引：12
|
作者：
MINNEAR, WP [1 ]
BRADT, RC [1 ]
机构：
[1] PENN STATE UNIV,COLL EARTH & MINERAL SCI,DEPT MAT SCI & ENGN,UNIVERSITY PK,PA 16802
来源：
JOURNAL OF THE AMERICAN CERAMIC SOCIETY | 1980年 / 63卷 / 9-10期
关键词：
D O I：
10.1111/j.1151-2916.1980.tb10749.x
中图分类号：
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：485 / 490
页数：6
相关论文
共 50 条
  • [1] ISOTHERMAL TRANSPORT IN TIO2-X .1. ELECTROMIGRATION IN TIO2-X
    AITYOUNES, N
    MILLOT, F
    GERDANIAN, P
    SOLID STATE IONICS, 1984, 12 (MAR) : 431 - 436
  • [2] ISOTHERMAL TRANSPORT IN TIO2-X .2. CHEMICAL DIFFUSION IN TIO2-X
    AITYOUNES, N
    MILLOT, F
    GERDANIAN, P
    SOLID STATE IONICS, 1984, 12 (MAR) : 437 - 442
  • [3] DISORDER IN TIO2-X
    CATLOW, CRA
    JAMES, R
    PROCEEDINGS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL PHYSICAL AND ENGINEERING SCIENCES, 1982, 384 (1786): : 157 - 173
  • [4] Thermoelectric properties of in-situ plasma spray synthesized sub-stoichiometry TiO2-x
    Lee, Hwasoo
    Han, Su Jung
    Seshadri, Ramachandran Chidambaram
    Sampath, Sanjay
    SCIENTIFIC REPORTS, 2016, 6
  • [5] Effects of Embedded TiO2-x Nanoparticles on Triboelectric Nanogenerator Performance
    Park, Hyun-Woo
    Nghia Dinh Huynh
    Kim, Wook
    Hwang, Hee Jae
    Hong, Hyunmin
    Choi, KyuHyeon
    Song, Aeran
    Chung, Kwun-Bum
    Choi, Dukhyun
    MICROMACHINES, 2018, 9 (08):
  • [6] A REASSESSMENT OF CHEMICAL DIFFUSIVITY IN TIO2-X
    MORIN, F
    SOLID STATE COMMUNICATIONS, 1986, 58 (03) : 161 - 164
  • [7] ELASTIC PROPERTIES OF POLYCRYSTALLINE TIO2-X
    MINNEAR, WP
    BRADT, RC
    JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1977, 60 (9-10) : 458 - 459
  • [8] Reactively sputtered TiO2-x thin films with plasma-emission-controlled departure from stoichiometry
    Zakrzewska, K
    Brudnik, A
    Radecka, M
    Posadowski, W
    THIN SOLID FILMS, 1999, 343 : 152 - 155
  • [9] Reactively sputtered TiO2-x thin films with plasma-emission-controlled departure from stoichiometry
    Institute of Electronics, University of Mining and Metallurgy, 30-059 Kraków, al., Mickiewicyi 30, Poland
    不详
    不详
    Thin Solid Films, (152-155):
  • [10] TiO2-x sputter for high rate deposition of TiO2
    Tachibana, Y
    Ohsaki, H
    Hayashi, A
    Mitsui, A
    Hayashi, Y
    VACUUM, 2000, 59 (2-3) : 836 - 843
12345