MECHANISM OF ULTRAVIOLET AND ELECTRON BONDING OF PERFLUOROPOLYETHERS

被引:60
|
作者
VURENS, GH
GUDEMAN, CS
LIN, LJ
FOSTER, JS
机构
[1] IBM Research Division, Almaden Research Center, San Jose, California 95120-6099
关键词
D O I
10.1021/la00040a024
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
It has recently been reported that thin films of perfluoropolyethers (PFPE's) can be bonded to a variety of substrates under illumination of 185-nm ultraviolet (UV) light. In this paper we examine the bonding of thin perfluoropolyether films by low-energy electrons and UV light. It is shown that the bonding takes place through interaction of the perfluoropolyether molecule, with a low-energy photoelectron created by excitation of the substrate by the UV photons. The perfluoropolyether molecule subsequently undergoes a dissociative electron attachment, resulting in the formation of a radical and a F- ion. It is likely that radical propagation and termination steps then cross-link the polymer and attach it to the substrate. The similarities and differences between electron-bonded and UV-bonded perfluoropolyether films are discussed.
引用
收藏
页码:1165 / 1169
页数:5
相关论文
共 50 条
  • [1] Mechanism of ultraviolet bonding of perfluoropolyethers revisited
    Guo, Xing-Cai
    Waltman, Robert J.
    LANGMUIR, 2007, 23 (08) : 4293 - 4295
  • [2] Ultraviolet bonding of perfluoropolyethers to carbon surfaces investigated using quantum chemical methods
    Alam, Md. Khorshed
    Zhang, Hedong
    Koga, Nobuaki
    Iuchi, Satoru
    MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS, 2013, 19 (9-10): : 1383 - 1391
  • [3] Ultraviolet bonding of perfluoropolyethers to carbon surfaces investigated using quantum chemical methods
    Md. Khorshed Alam
    Hedong Zhang
    Nobuaki Koga
    Satoru Iuchi
    Microsystem Technologies, 2013, 19 : 1383 - 1391
  • [4] The photodissociation of perfluoropolyethers by ultraviolet light
    Waltman, R. J.
    Guo, Xing-Cai
    TRIBOLOGY LETTERS, 2007, 27 (02) : 227 - 231
  • [5] The Photodissociation of Perfluoropolyethers by Ultraviolet Light
    R. J. Waltman
    Xing-Cai Guo
    Tribology Letters, 2007, 27 : 227 - 231
  • [6] THE MECHANISM OF ULTRAVIOLET BONDING OF PERFLUOROPOLYETHER LUBRICANTS
    VURENS, GH
    GUDEMAN, CS
    LIN, LJ
    FOSTER, JS
    IEEE TRANSACTIONS ON MAGNETICS, 1993, 29 (01) : 282 - 285
  • [7] Transparent perfluoropolyethers for vacuum ultraviolet applications
    Bassi, M
    Guarda, PA
    Pagano, E
    Sanguineti, A
    Marchionni, G
    JOURNAL OF PHYSICAL CHEMISTRY B, 2006, 110 (24): : 12172 - 12178
  • [8] Solvent-dependant hydrogen bonding in perfluoropolyethers
    Spiese, CE
    Kasai, P
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2003, 225 : U513 - U513
  • [9] Electron radiation mechanism in ultraviolet laser ablation of copper
    Phys. Dept., Maoming College, Maoming 525000, China
    Guangdian Gongcheng, 2007, 2 (69-73):
  • [10] Electron trapping: a mechanism for acid production in extreme ultraviolet photoresists
    Grzeskowiak, Steven
    Kaminsky, Jake
    Gibbons, Sean
    Narasimhan, Amrit
    Brainard, Robert L.
    Denbeaux, Greg
    JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2018, 17 (03):