On the factors affecting the reflection intensities by the several methods of x-ray analysis of crystal structures

被引:33
作者
Blake, FC [1 ]
机构
[1] Ohio State Univ, Mendenhall Lab Phys, Columbus, OH USA
关键词
D O I
10.1103/RevModPhys.5.169
中图分类号
O4 [物理学];
学科分类号
0702 ;
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页码:0169 / 0202
页数:34
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