CHEMICAL VAPOR-DEPOSITION OF ALUMINUM ENHANCED BY MAGNETRON-PLASMA

被引：7

作者：

KATO, T ^{[1
]}

ITO, T ^{[1
]}

MAEDA, M ^{[1
]}

机构：

[1] FUJITSU LABS LTD,KAWASAKI,KANAGAWA 211,JAPAN

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1988年 / 135卷 / 02期

关键词：

D O I：

10.1149/1.2095637

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：455 / 459

页数：5

共 50 条

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