ON SPUTTERING MECHANISM IN ENERGY RANGE OF RUTHERFORD BACKSCATTERING

被引：21

作者：

BEHRISCH, R

WEISSMAN, R

机构：

[1] Institut für Plasmaphysik

来源：

PHYSICS LETTERS A | 1969年 / A 30卷 / 09期

关键词：

D O I：

10.1016/0375-9601(69)90273-4

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

Sputtering rates for 100 keV protons incident normally on Cu and Pt films deposited on various base materials were determined from the energy spectrum of the backscattered protons. Sputtering is partly caused by ions backscattered from the base material. © 1969.

引用

页码：506 / +

页数：1

共 11 条

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