ROLE OF THE TRICHLOROSILYL RADICAL AND DICHLOROSILYLENE IN GAS-PHASE REACTIONS OF TRICHLOROSILANE

被引：9
|
作者：
HEINICKE, J
GEHRHUS, B
机构：
[1] Institut of Inorganic Chemistry, University of Greifswald
来源：
JOURNAL OF ANALYTICAL AND APPLIED PYROLYSIS | 1994年 / 28卷 / 01期
关键词：
DICHLOROSILYLENE; GAS PHASE; PYROLYSIS; TRICHLOROSILANE; TRICHLOROSILYL RADICAL;
D O I：
10.1016/0165-2370(93)00764-E
中图分类号：
O65 [分析化学];
学科分类号：
070302 ; 081704 ;
摘要：
Cothermolytic reactions of trichlorosilane with chlorobenzene and 1,3-butadiene as well as partial thermolysis of HSiCl3, were studied to estimate the importance of SiCl2 compared to SiCl3 in such reactions. It is shown that SiCl2 may be formed at a temperature of 670-degrees-C via recombination of .SiCl3 and alpha-elimination from Si2Cl6, while direct formation by a monomolecular alpha-elimination from HSiCl3 starts at higher temperatures (above 800-1000-degrees-C) only. Rapid trapping Of .SiCl3 in copyrolyses suppresses SiCl2 formation as indicated by the product distribution.
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页码：81 / 92
页数：12
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