HYDROGEN PASSIVATION OF CARBON-DOPED GALLIUM-ARSENIDE

被引:24
|
作者
BONAPASTA, AA
机构
[1] Consiglio Nazionale delle Ricerche (CNR), Istituto Chimica dei Materiali (ICMAT), 00016 Monterotondo Scalo, Via Salaria Km 29
关键词
D O I
10.1103/PhysRevB.48.8771
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The stability of a C atom at the cationic and anionic sites in GaAs and the hydrogen passivation of the C dopant activity have been investigated by performing first-principles total-energy calculations within the pseudopotential-density-functional-theory framework. In these calculations it is found that the C atom has almost the same stability at the gallium and at the arsenic sites. It is suggested that the preferred incorporation of C at the As site is due to phenomena occurring at the grown surface of GaAs. The H atom forms stable complexes with both the C acceptor (C(As)) and the C donor (C(Ga)). The H-C(As) and H-C(Ga) complexes show the same structural features despite previous theoretical results. They are both characterized by a stable configuration where the H atom is located at the bond-centered site by a strong H-C interaction and by negligible interactions of H with the host atoms. Present results give theoretical evidence of the hydrogen passivation of C donors and acceptors. Moreover, they suggest that hydrogen may form strong bonds with carbon and passivate its dopant activity even in other III-V semiconductors.
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页码:8771 / 8779
页数:9
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