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- [3] HYDROGEN CONTENT OF PLASMA-DEPOSITED SILICON-NITRIDEJOURNAL OF APPLIED PHYSICS, 1978, 49 (04) : 2473 - 2477LANFORD, WARAND, MJ
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- [5] HYDROGEN ANALYSIS IN SILICON AND SILICON-NITRIDE LAYERSSPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY, 1985, 40 (5-6) : 781 - 785VANDERVORST, WBMAES, HE
- [6] STUDY ON THE OPTICAL-PROPERTIES AND HYDROGEN CONTENT OF THE SILICON-NITRIDE THIN-FILMACTA PHYSICA SINICA-OVERSEAS EDITION, 1995, 4 (09): : 698 - 704CHEN, JFREN, ZXDING, ZF
- [7] FORMATION OF SILICON-NITRIDE FILM BY PLASMA DECOMPOSITION OF METHYLSILAZANEJOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1995, 78 (05) : 1420 - 1422MORIWAKI, TMATSUMOTO, O
- [8] PLASMA-DEPOSITED SILICON-NITRIDE FILMS WITH LOW HYDROGEN CONTENT FOR AMORPHOUS-SILICON THIN-FILM TRANSISTORS APPLICATIONSENSORS AND ACTUATORS A-PHYSICAL, 1993, 37-8 : 333 - 336CAMPMANY, JANDUJAR, JLCANILLAS, ACIFRE, JBERTRAN, E
- [10] IMPLANTED HYDROGEN IN SILICON-NITRIDEJOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (08) : C377 - C377STEIN, HJ