KINETIC STUDY ON UNDERPOTENTIAL COPPER DEPOSITION ON PLATINUM IN SULFURIC AND HYDROCHLORIC-ACID SOLUTIONS

被引：3

作者：

NIHEI, K ^{[1
]}

OHSAKA, T ^{[1
]}

ANZAI, K ^{[1
]}

机构：

[1] WASEDA UNIV,DIV APPL CHEM,SHINJUKU KU,TOKYO 160,JAPAN

来源：

DENKI KAGAKU | 1979年 / 47卷 / 07期

关键词：

D O I：

10.5796/kogyobutsurikagaku.47.415

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：415 / 421

页数：7

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