ELECTRON-BEAM LITHOGRAPHY - ITS APPLICATIONS

被引：23
|
作者：
HOHN, FJ
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1989年 / 7卷 / 06期
关键词：
D O I：
10.1116/1.584546
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：1405 / 1411
页数：7
相关论文
共 50 条
  • [1] ELECTRON-BEAM LITHOGRAPHY-TOOLS AND APPLICATIONS
    HOHN, FJ
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1991, 30 (11B): : 3088 - 3092
  • [2] Electron-beam microcolumns for lithography and related applications
    Chang, THP
    Thomson, MGR
    Kratschmer, E
    Kim, HS
    Yu, ML
    Lee, KY
    Rishton, SA
    Hussey, BW
    Zolgharnain, S
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1996, 14 (06): : 3774 - 3781
  • [3] ELECTRON-BEAM LITHOGRAPHY
    HERRIOTT, DR
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 20 (03): : 781 - 785
  • [4] ELECTRON-BEAM LITHOGRAPHY
    EVERHART, TE
    BULLETIN OF THE AMERICAN PHYSICAL SOCIETY, 1977, 22 (03): : 276 - 276
  • [5] Electron-beam lithography
    Oczos, Kazimierz
    Mechanik, 1988, 61 (07): : 341 - 343
  • [6] ELECTRON-BEAM LITHOGRAPHY
    PEASE, RFW
    CONTEMPORARY PHYSICS, 1981, 22 (03) : 265 - 290
  • [7] ELECTRON-BEAM LITHOGRAPHY
    HERRIOTT, DR
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1982, 129 (03) : C102 - C102
  • [8] Electron-beam lithography
    Harriott, L
    Liddle, A
    PHYSICS WORLD, 1997, 10 (04) : 41 - 45
  • [9] Electron-beam lithography simulation for EUV mask applications
    Patsis, GP
    Glezos, N
    Second Conference on Microelectronics, Microsystems and Nanotechnology, 2005, 10 : 385 - 388
  • [10] ELECTRON-BEAM INSTRUMENTS AND ELECTRON LITHOGRAPHY
    VASICHEV, BN
    SOVIET JOURNAL OF OPTICAL TECHNOLOGY, 1982, 49 (12): : 778 - 785
12345