GAS-PHASE AND SURFACE CHEMICAL-REACTIONS IN THE PREPARATION OF SILICON-CONTAINING FILMS FROM MOLECULAR PRECURSORS

被引：0

作者：

SCOTT, BA ^{[1
]}

机构：

[1] IBM CORP, THOMAS J WATSON RES CTR, DIV RES, YORKTOWN HTS, NY 10598 USA

来源：

ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 1991年 / 202卷

关键词：

D O I：

暂无

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

引用

页码：121 / INOR

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