SURFACE CHARGES INDUCED BY MECHANICAL STRESSES IN SILICON-SILICON OXIDE INTERFACE

被引:13
作者
FRIEDRICH, H
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10.1016/0038-1101(71)90139-0
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TM [电工技术]; TN [电子技术、通信技术];
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0808 ; 0809 ;
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页码:639 / +
页数:1
相关论文
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SCHLEGEL, WA .
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[5]   RESIDUAL STRESSES AT AN OXIDE-SILICON INTERFACE [J].
WHELAN, MV ;
GOEMANS, AH ;
GOOSSENS, LM .
APPLIED PHYSICS LETTERS, 1967, 10 (10) :262-&