CHEMICAL-PROCESSING OF THIN CHROMIUM FILMS

被引:1
|
作者
SZEP, IC
机构
[1] Research Institute for Technical Physics, the Hungarian Academy of Science, Budapest, 1325
关键词
D O I
10.1016/0040-6090(91)90478-G
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Conditions for the chemical dissolution of thin chromium films in mildly acting media were investigated. Electrode potentials and static polarization curves of chromium-plated electrodes in solutions of varying hydrogen ion activity were measured and average dissolution potentials determined. With redox couples corresponding to the appropriate dissolution potentials suitable conditions were found for the chemical dissolution of chromium both in mild acidic and in alkaline media, avoiding the region of passivity and also the necessity to use chemicals destructive to other materials present.
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页码:101 / 105
页数:5
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