INFLUENCE OF DIELECTRIC CONTRAST AND TOPOGRAPHY ON THE NEAR-FIELD SCATTERED BY AN INHOMOGENEOUS SURFACE

被引：78
|
作者：
CARMINATI, R
GREFFET, JJ
机构：
[1] Laboratoire d’Energétique Macroscopique et Moléculaire, Combustion Ecole Centrale Paris Centre National de la Recherche Scientifique, Grande Voie des Vignes, Chatenay-Malabry Cedex
来源：
JOURNAL OF THE OPTICAL SOCIETY OF AMERICA A-OPTICS IMAGE SCIENCE AND VISION | 1995年 / 12卷 / 12期
关键词：
D O I：
10.1364/JOSAA.12.002716
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
The influence of topography and variations of optical properties on the near field scattered by an inhomogeneous sample is analyzed. A perturbative expression of the near Geld is derived and its range of validity is investigated. This expression shows quantitatively how dielectric contrast and topography modulate the near-field distribution close to a surface. It is shown that the near-field images, produced by conventional near-field optical devices, are sensitive to the integral of the dielectric contrast along the vertical direction across the sample. This point is illustrated by a numerical simulation of the near field scattered by surfaces exhibiting submicronic asperities and subsurface structures. (C) 1995 Optical Society of America.
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收藏
页码：2716 / 2725
页数：10
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