共 28 条
- [2] The effectiveness of HCl and HF cleaning of Si0.85Ge0.15 surface JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2008, 26 (05): : 1248 - 1250
- [8] Interfacial stability of an indium tin oxide thin film deposited on Si and Si0.85Ge0.15 1600, American Institute of Physics Inc. (88):
- [10] Low temperature Si0.85Ge0.15 oxynitridation in wet-nitric oxide ambient COMOS FRONT-END MATERIALS AND PROCESS TECHNOLOGY, 2003, 765 : 127 - 132