FABRICATION OF LARGE-SCALE OPTICAL-COMPONENTS IN SILICON BY REACTIVE ION ETCHING

被引：12
|
作者：
DARBYSHIRE, DA
PITT, CW
STRIDE, AA
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1987年 / 5卷 / 02期
关键词：
D O I：
10.1116/1.583951
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：575 / 578
页数：4
相关论文
共 50 条
  • [1] Fabrication of silicon nanostructures with large taper angle by reactive ion etching
    Saffih, Faycal
    Con, Celal
    Alshammari, Alanoud
    Yavuz, Mustafa
    Cui, Bo
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2014, 32 (06):
  • [2] Large-scale Patterning of Hydrophobic Silicon Nanostructure Arrays Fabricated by Dual Lithography and Deep Reactive Ion Etching
    Zhibo Ma
    Chengyu Jiang
    Weizheng Yuan
    Yang He
    Nano-Micro Letters, 2013, 5 : 7 - 12
  • [3] Large-scale Patterning of Hydrophobic Silicon Nanostructure Arrays Fabricated by Dual Lithography and Deep Reactive Ion Etching
    Ma, Zhibo
    Jiang, Chengyu
    Yuan, Weizheng
    He, Yang
    NANO-MICRO LETTERS, 2013, 5 (01) : 7 - 12
  • [4] Large-scale Patterning of Hydrophobic Silicon Nanostructure Arrays Fabricated by Dual Lithography and Deep Reactive Ion Etching
    Zhibo Ma
    Chengyu Jiang
    Weizheng Yuan
    Yang He
    Nano-Micro Letters, 2013, 5 (01) : 7 - 12
  • [5] Large-scale Patterning of Hydrophobic Silicon Nanostructure Arrays Fabricated by Dual Lithography and Deep Reactive Ion Etching
    Zhibo Ma
    Chengyu Jiang
    Weizheng Yuan
    Yang He
    Nano-Micro Letters, 2013, (01) : 7 - 12
  • [6] FABRICATION OF OPTICAL-COMPONENTS BY DIAMOND TURNING
    POPOV, LV
    SOVIET JOURNAL OF OPTICAL TECHNOLOGY, 1978, 45 (10): : 648 - 650
  • [7] Techniques of cryogenic reactive ion etching in silicon for fabrication of sensors
    Henry, M. David
    Welch, Colin
    Scherer, Axel
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2009, 27 (05): : 1211 - 1216
  • [8] OPTICAL FABRICATION CONSIDERATIONS AND TRADEOFFS FOR LASER OPTICAL-COMPONENTS
    GRINDEL, MW
    PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1983, 399 : 378 - 384
  • [9] Fabrication of infrared hologram optical element by reactive ion etching
    Kawata, K
    Toyoda, R
    Kawauchi, Y
    PRECISION ENGINEERING, NANOTECHNOLOGY, VOL. 2, 1999, : 44 - 47
  • [10] FABRICATION OF SILICON-BASED OPTICAL-COMPONENTS FOR AN ULTRACLEAN ACCELERATOR MASS-SPECTROMETRY NEGATIVE-ION SOURCE
    KIRCHHOFF, JF
    MARBLE, DK
    WEATHERS, DL
    MCDANIEL, FD
    MATTESON, S
    ANTHONY, JM
    BEAVERS, RL
    BENNETT, TJ
    REVIEW OF SCIENTIFIC INSTRUMENTS, 1994, 65 (05): : 1570 - 1574
12345