CHEMICAL BONDING AT THE SI-METAL INTERFACE - SI-NI AND SI-CR

被引：68
|
作者：
FRANCIOSI, A
WEAVER, JH
ONEILL, DG
CHABAL, Y
ROWE, JE
POATE, JM
BISI, O
CALANDRA, C
机构：
[1] BELL TEL LABS INC,MURRAY HILL,NJ 07974
[2] UNIV MODENA,I-41100 MODENA,ITALY
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1982年 / 21卷 / 02期
关键词：
D O I：
10.1116/1.571800
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：624 / 627
页数：4
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