THE APPLICATION OF ION-BEAM MIXING, DOPED SILICIDE, AND RAPID THERMAL-PROCESSING TO SELF-ALIGNED SILICIDE TECHNOLOGY

被引：0
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作者：
KU, YH
LEE, SK
TING, W
KWONG, DL
机构：
来源：
1989 INTERNATIONAL SYMPOSIUM ON VLSI TECHNOLOGY, SYSTEMS AND APPLICATIONS: PROCEEDINGS OF TECHNICAL PAPERS | 1989年
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TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
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页码：337 / 341
页数：5
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